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Baumeister Mediasoft Engineering |
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Sorry, this information is currently being updated. 5.3.1 Creating and Editing Chip LayoutsSorry, this information is currently being updated. 5.3.2 Cell Makros, PlacementSorry, this information is currently being updated. 5.3.3 Text and GraphicSorry, this information is currently being updated. 5.3.4 Traces, RoutingSorry, this information is currently being updated.
IC Mask Layout • © 1985-2023 Oliver Bartels F+E • Updated: 04 April 2011, 11:03 [UTC] |
Baumeister Mediasoft Engineering, Clontarf, Dublin 3, D03 HA22, Ireland © 2023 Manfred Baumeister |
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